Dresden 2014 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 86: Organic Electronics and Photovoltaics VI (DS jointly with CPP, HL, O)
O 86.1: Vortrag
Donnerstag, 3. April 2014, 17:45–18:00, CHE 91
The role of residual additives on the stability of polymer blend materials for organic photovoltaic applications. — •Aurélien Tournebize1,2, Agnès Rivaton2, Heiko Peisert1, and Thomas Chassé1 — 1Institute of Physical and Theoretical Chemistry, Tübingen, Germany — 2Institut de Chimie de Clermont-Ferrand, France
Processing additives for improved the morphology of the bulk heterojunction (BHJ) materials used in organic solar cells (OSCs) is now very popular. Thus, by optimizing the donor and acceptor nano domains, the efficiency of OSCs devices could be significantly increased. [1] The impact of those additives on the performances has been widely explored recently but nothing in terms of stability. And yet, a part of the additives stays trapped in the thin film [2] and could participate in the complex photodegradation of the polymer blend materials.
In the present work, we have investigated the impact of residual additives on the polymer blend photostability. By using essentially spectroscopic technics, we have observed an acceleration of the polymer blend photodegradation in presence of additives. In this context, the use of new additives providing a better morphology and by the way a better stability was also explored.
[1] J.K. Lee, W.L. Ma, C.J. Brabec, J. Yuen, J.S. Moon, J.Y. Kim, K. Lee, G.C. Bazan, and A.J. Heeger JACS. 2008, 130, 3619-3623 [2] L. Ye, Y. Jing, X. Guo, H. Sun, S. Zhang, M. Zhang, L. Huo, and J. Hou J. Phys. Chem. C 2013, 117, 14920-14928