Dresden 2014 – scientific programme
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O: Fachverband Oberflächenphysik
O 95: Micro- and Nanopatterning (DS jointly with O)
O 95.7: Talk
Friday, April 4, 2014, 11:00–11:15, CHE 89
Interference Lithography Combined with Hard Anodization Leading to Highly Ordered Nanoporous Alumina — Josep M. Montero Moreno1, •Robert Zierold1, Martin Waleczek1, Stephan Martens1, Victor Vega Martinez2, Victor M. Prida2, and Kornelius Nielsch1 — 1Institut für Angewandte Physik, Universität Hamburg — 2Department of Physics, University of Oviedo
A perfect order of the pores in nanoporous alumina is desired for application in the fields magneto-optical and opto-electronic devices, photonic crystals, solar cells, fuel cells, and chemical and biochemical sensing systems, to name a few.
We present the fabrication of thick nanoporous Al2O3 membranes with mono-oriented, perfect hexagonal packing of pores, and precise control of all structural parameters over large areas by matching the conditions of three-beam laser interference lithography and subsequent hard anodization. The periodic concavities after the patterning step in the aluminum surface guide the pore nucleation during the anodization, and the self-ordering phenomenon guarantees the maintenance of the predefined arrangement throughout the entire layer.
The cylindrical pores—diameters adjustable between 20 and 450 nm with advanced post-processing techniques such as atomic layer deposition or selective-chemical etching—are uniform in shape and widely tunable in their dimensions with aspect ratios as high as 500. With that technique, the interpore distance can be easily and accurately tuned in the range of 200 to 500 nm without time-consuming prefabrication of hard-masking stamps.