Dresden 2014 – scientific programme

Parts | Days | Selection | Search | Updates | Downloads | Help

O: Fachverband Oberflächenphysik

O 96: Atomic Layer Deposition (DS jpointly with O)

O 96.4: Talk

Friday, April 4, 2014, 10:30–10:45, CHE 91

X-ray linear dichroism in atomic layer deposited Titanium dioxide layers — •Chittaranjan Das, Massimo Tallarida, and Dieter Schmeisser — Applied physics and sensors,BTU Cottbus, Germany

Among the various metal oxides TiO2 has been investigated because of its wide range of applications in various fields such as self-cleaning, photocatalysis, solar cell, water splitting, bio-implants. In order to increase its efficiency in water splitting and solar cell energy conversion, it is necessary to understand the crystal structure and electronic properties of thin films. Generally the process of synthesis may modify the electronic properties of TiO2. In the present work we show X-ray linear dichroism (XLD) measurements of TiO2 thin films of different polymorphs. Titania thin films were produced by atomic layer deposition (ALD) and were characterized in-situ with X-ray photoelectron and absorption spectroscopy at synchrotron radiation center BESSY-II. We found that that all titania phases show XLD at Ti-L and O-K edges, but the intensity of XLD is different for different phases. We discuss our data in terms of the partial density of states.