Berlin 2015 – wissenschaftliches Programm

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DF: Fachverband Dielektrische Festkörper

DF 8: High-k and Low-k Dielectrics (DS with DF)

Dienstag, 17. März 2015, 11:15–12:15, H 0111

	11:15	DF 8.1	Broadband dielectric response of doped rutile: intrinsic or extrinsic colossal dielectric constants? — •Martin Wohlauer, Stephan Krohns, Peter Lunkenheimer, and Alois Loidl
	11:30	DF 8.2	Structuring and interface manipulation of ultra-thin silicate films on a Si(001) surface — •Shariful Islam, Karl Hofmann, and Herbert Pfnür
	11:45	DF 8.3	k-restore Process with Plasma Enhanced Fragmentation for Damaged ULK Materials — A DFT and MD Study — •Anja Förster, Christian Wagner, Jörg Schuster, Sibylle Gemming, and Stefan Schulz
	12:00	DF 8.4	The contribution has been withdrawn.