Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe

DS: Fachverband Dünne Schichten

DS 14: Plasmonics and nanooptics: Structure, fabrication and characterization (joint session with O)

DS 14.1: Vortrag

Dienstag, 17. März 2015, 10:30–10:45, MA 043

Large-area spectrally selective plasmonic perfect absorber sensor fabricated by laser interference lithography — •Shahin Bagheri, Nikolai Strohfeldt, Andreas Tittl, and Harald Giessen — 4th Physics Institute and Research Center SCoPE, University of Stuttgart, Pfaffenwaldring 57, 70569 Stuttgart, Germany

We employ laser interference lithography to create homogeneous wire and rectangle arrays and utilize them for manufacturing of large-area plasmonic perfect absorbers [1]. Geometry and periodicity of such tailored nanostructures can be precisely controlled by adjusting the interference conditions in single- and double-exposure processes, resulting in spectrally selective perfect absorption of light from the visible to the mid-infrared wavelength range. We also demonstrate the applicability of our fabrication method for detection schemes by measuring the hydrogen sensing performance of a palladium-based perfect absorber operating in the visible wavelength range. Due to the large-area and fast fabrication process, our method offers a great potential for low-cost commercial nanophotonic and plasmonic devices in industrial applications.

[1] S. Bagheri et al., Adv. Opt. Mater. 2, 1050-1056 (2014)