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DS: Fachverband Dünne Schichten
DS 14: Plasmonics and nanooptics: Structure, fabrication and characterization (joint session with O)
DS 14.3: Vortrag
Dienstag, 17. März 2015, 11:00–11:15, MA 043
Extreme Ultraviolet Proximity Lithography for fast, flexible and large-scale fabrication of infrared antennas — •Georg Kunkemöller1,3, Tobias W.W. Maß2, Ann-Katrin U. Michel2, Hyun-Su Kim3, Sascha Brose1, Serhiy Danylyuk1, Thomas Taubner2, and Larissa Juschkin3 — 1TOS, RWTH Aachen University — 2I. Institute of Physics (IA), RWTH Aachen University — 3Chair for Experimental Physics of Extreme-Ultraviolet EUV, RWTH Aachen University
Recently, several lithographic approaches to improve throughput and costs for the fabrication of infrared antennas by using parallel processes were presented [1-4]. In this contribution, we present Extreme ultraviolet (EUV) proximity lithography as a comparable advantageous technique for the fabrication of large arrays of infrared antennas. Using Fresnel-diffraction, this method offers the potential of a great variety of structures [5]. Depending on deposure time and gap between mask and resist, different dumbbell-shaped structures can be fabricated using only a single mask-geometry. Characterization via SEM imaging and FTIR spectroscopy show a good agreement to lithograpy- and FDTD simulations and turns this fabrication method to a promising tool for a large-area fabrication of infrared nanostructures.
[1] Hoffmann et al. J. Phys. Chem. C 2013 117, 11311-11316
[2] Cataldo et al. ACS Nano 2012 6, 979-985
[3] Aksu et al. Nano Lett. 2010 10, 2511-2518
[4] Bagheri et al. Adv. Opt. Mat. 2014 2, 1050-1056
[5] Danylyuk et al. J. Vac. Sci. Technol. B 2013 31, 021602