Berlin 2015 –
wissenschaftliches Programm
DS 16: Atomic Layer Deposition
Dienstag, 17. März 2015, 12:15–13:00, H 0111
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12:15 |
DS 16.1 |
SiO2-, Al2O3-, and TiO2-nanotubes synthesized by ALD in etched ion-track membranes — •Anne Spende, Nicolas Sobel, Christian Hess, Manuela Lukas, Bernd Stühn, Josep M Montero Moreno, Robert Zierold, Kornelius Nielsch, Christina Trautmann, and Maria Eugenia Toimil-Molares
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12:30 |
DS 16.2 |
Atomic Layer Deposition and characterization of Ga-doped Sb2Te3 thin films at low temperatures. — •Christoph Wiegand, Monika Rusek, Johannes Gooth, Robert Zierold, Stephan Schulz, and Kornelius Nielsch
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12:45 |
DS 16.3 |
Encapsulation of Silver Nanowires in Transparent Conductive Oxides by Atomic Layer Deposition — •Manuela Göbelt, Ralf Keding, Björn Hoffmann, Sebastian Schmitt, Sara Jäckle, Michael Latzel, and Silke Christiansen
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