Berlin 2015 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 16: Atomic Layer Deposition
DS 16.1: Vortrag
Dienstag, 17. März 2015, 12:15–12:30, H 0111
SiO2-, Al2O3-, and TiO2-nanotubes synthesized by ALD in etched ion-track membranes — •Anne Spende1,2, Nicolas Sobel2, Christian Hess2, Manuela Lukas2, Bernd Stühn2, Josep M Montero Moreno3, Robert Zierold3, Kornelius Nielsch3, Christina Trautmann1,2, and Maria Eugenia Toimil-Molares1 — 1Materialforschung, GSI Helmholtzzentrum für Schwerionenforschung, Darmstadt — 2Technische Universität Darmstadt — 3Universität Hamburg
Nanochannels and nanotubes of tailored dimensions and surface coatings are of great interest for basic research and applications e.g. in nanofluidics or sensoric. By combining ion-track nanotechnology with atomic layer deposition (ALD), we present a novel approach to fabricate inorganic nanotubes and surface modified nanochannels with aspect ratios above 3000. 30 µm thick polycarbonate foils are irradiated with GeV Au ions at the UNILAC accelerator of GSI. Subsequent chemical etching converts the ion tracks into open, cylindrical channels, with smallest achievable diameter presently down to 18 nm. We further reduced channel diameters of etched ion-track membranes in a controlled manner by applying ALD to coat the surface with SiO2, Al2O3, and TiO2. By dissolving the polymer template, nanotubes with well defined wall thickness were obtained. ALD-coated membranes and released nanotubes were analysed by small-angle x-ray spectroscopy, electron microscopy and EDX. The coating is shape conformal and highly homogeneous along the entire channel length. XPS shows the stoichiometric composition of the deposited films.