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Verhandlungen
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Berlin 2015 – scientific programme

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DS: Fachverband Dünne Schichten

DS 16: Atomic Layer Deposition

Tuesday, March 17, 2015, 12:15–13:00, H 0111

12:15 DS 16.1 SiO2-, Al2O3-, and TiO2-nanotubes synthesized by ALD in etched ion-track membranes — •Anne Spende, Nicolas Sobel, Christian Hess, Manuela Lukas, Bernd Stühn, Josep M Montero Moreno, Robert Zierold, Kornelius Nielsch, Christina Trautmann, and Maria Eugenia Toimil-Molares
12:30 DS 16.2 Atomic Layer Deposition and characterization of Ga-doped Sb2Te3 thin films at low temperatures. — •Christoph Wiegand, Monika Rusek, Johannes Gooth, Robert Zierold, Stephan Schulz, and Kornelius Nielsch
12:45 DS 16.3 Encapsulation of Silver Nanowires in Transparent Conductive Oxides by Atomic Layer Deposition — •Manuela Göbelt, Ralf Keding, Björn Hoffmann, Sebastian Schmitt, Sara Jäckle, Michael Latzel, and Silke Christiansen
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