Berlin 2015 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 22: Interfaces and Thin Films III (joint session with CPP)
DS 22.6: Vortrag
Mittwoch, 18. März 2015, 10:45–11:00, C 243
Ambiguous Copolymer Surfaces from Light-Mediated Radical Polymerization — •Christian W. Pester1,2, Justin E. Poelma2, Craig J. Hawker2, and Edward J. Kramer1 — 1UC Santa Barbara, Department of Materials, Department of Chemical Engineering — 2Department of Chemistry and Biochemistry, Materials Research Laboratory, Santa Barbara, CA, 93106
We describe the use of visible-light-mediated living radical polymerization of methacrylate-based, anti-fouling relevant monomers, i.e., poly(trifluoroethyl methacrylate) (TFEMA) and poly(ethylene glycol methacrylate) (PEGMA). Resulting ambiguous surfaces are expected to show promising features for marine anti-fouling applications. Light-catalysis affords facile lithographic patterning. In this PEGMA-b-TFEMA case study we patterned these diblocks to give topographically and chemically well-defined ambiguous surfaces which combine hydrophilic and hydrophobic properties on the micron length scale. XPS, dynamic secondary ion mass spectroscopy, and scanning x-ray transmission microscopy, allowed us to precisely determine chemical surface composition, whereas AFM afforded precise analysis of topographical features inherent to patterning. The light-activated polymerization method we use was readily coupled to well-established ATRP techniques and afforded expansion of this case study to advanced monomers, e.g, highly fluorinated compounds and zwitterionic acrylates. Polymer backbone functionalization combined with lithography allowed spatial control over brush architecture, adding to the wide chemical and conformational accessible parameter space.