Berlin 2015 – scientific programme
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DS: Fachverband Dünne Schichten
DS 24: Metal substrates: Structure, epitaxy and growth (joint session with O)
DS 24.9: Talk
Wednesday, March 18, 2015, 12:30–12:45, MA 042
Development and testing of a plasma coating apparatus — •Cornelia Kunz1, Sebastian Dahle1,2, and Wolfgang Maus-Friedrichs1,2 — 1Institut für Energieforschung und Physikalische Technologien, Technische Universität Clausthal, Leibnizstraße 4, D-38678 Clausthal-Zellerfeld, Germany — 2Clausthaler Zentrum für Materialtechnik, Technische Universität Clausthal, Agricolastraße 2, D-38678 Clausthal-Zellerfeld, Germany
Thin coatings on metal surfaces have known advantages in many applications, e.g. passivation or corrosion protection. In this work, a plasma coating apparatus was constructed and tested to develop uniform, particle-free coatings on titanium surfaces. A primary Si3N-coating was achieved via plasma ignition in nitrogen diluted silane at atmospheric pressure. A procedure was devised to control the growth mechanisms yielding particle-free coatings. In order to minimize particle formation, nucleation and agglomeration of radicals formed in the plasma have to be inhibited. The critical parameter leading to a silicon radical controlled growth mode and thus to minimized nucleation was found to be the excitation frequency. In a secondary step, these Si3N-coatings were treated with air plasma, leading to oxidation and clean silicon dioxide coatings. Surface topography was analysed using atomic force microscopy (AFM) in order to determine a growth mode suppressing particle formation mode. In a following step, surface stoichiometry was determined via X-ray photoelectron spectroscopy (XPS).