Berlin 2015 – scientific programme
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DS: Fachverband Dünne Schichten
DS 26: Layer Properties: Electrical, Optical, and Mechanical Properties
DS 26.2: Talk
Wednesday, March 18, 2015, 15:15–15:30, H 2032
Challenges in Depositing Aluminum Oxynitride Films by Reactive DC Magnetron Sputtering — •Maria Fischer, Mathis Trant, Kerstin Thorwarth, Hans Josef Hug, and Jörg Patscheider — Empa, Laboratory for Nanoscale Materials Science, Überlandstr. 129, CH-8600 Dübendorf, Switzerland
Thin, transparent coatings of aluminum oxynitride with different oxygen contents were prepared by reactive direct current (DC) magnetron sputtering from a pure aluminum target. The simultaneous use of the two reactive gases O2 and N2 poses challenges due to their different chemical behavior towards metallic targets. Various experimental parameters, including the position of the O2 gas inlet inside the deposition chamber, have a strong influence on film properties and reproducibility. This applies also to the target poisoning and erosion state; experiments conducted at otherwise equal conditions yielded deposition rates varying by a factor of 2.5.
The setup in a conventional sputter deposition system was altered to improve the controllability of deposition processes conducted with an O2/N2 gas mixture. The influences of the different experimental configurations on resulting films were investigated in terms of reproducibility, deposition rate, crystallinity, morphology, biaxial stress and hardness.