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Berlin 2015 – scientific programme

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DS: Fachverband Dünne Schichten

DS 26: Layer Properties: Electrical, Optical, and Mechanical Properties

Wednesday, March 18, 2015, 15:00–19:00, H 2032

15:00 DS 26.1 Tunable Ion Bombardment Induced by Altering Plasma Confinement in Magnetron Sputtering — •Mathis Trant, Maria Fischer, Kerstin Thorwarth, Hans Josef Hug, and Jörg Patscheider
15:15 DS 26.2 Challenges in Depositing Aluminum Oxynitride Films by Reactive DC Magnetron Sputtering — •Maria Fischer, Mathis Trant, Kerstin Thorwarth, Hans Josef Hug, and Jörg Patscheider
15:30 DS 26.3 Mechanische Spannungen in Cr-dotierten α-Al2O3-Schichten — •Sebastian Schipporeit, Ali Haligür, Markus Neubert und Volker Buck
15:45 DS 26.4 Solution Processed Deposition of Large-Size MoS2 Nanoflakes — •Xiaoling Zeng, Marlis Ortel, and Veit Wagner
16:00 DS 26.5 Structural and electrical characterization of the ferecrystals [(SnSe)1+δ]m(NbSe2)1 — •Corinna Grosse, Matti Alemayehu, Olivio Chiatti, Anna Mogilatenko, David C. Johnson, and Saskia F. Fischer
16:15 DS 26.6 Weak antilocalization and disorder induced electron-electron-interaction in DC-magnetron-sputtered Sb2Te3 and Bi2Te3 thin films — •Tobias Schäfer, Hanno Volker, and Matthias Wuttig
16:30 DS 26.7 Tip-enhanced Raman spectroscopy (TERS) on La2CoMnO6 thin films: Field enhancement and polarisation effects — •Christoph Meyer, Sebastian Merten, Sebastian Hühn, Markus Jungbauer, Vasily Moshnyaga, Bernd Damaschke, and Konrad Samwer
  16:45 15 min. break.
17:00 DS 26.8 Nitrogen concentration dependence of the stiffness of silicon nitride layers formed by low-dose N+ ion implantation — •Marina Sarmanova, Helmut Karl, Stephan Mändl, Dietmar Hirsch, Stefan G. Mayr, and Bernd Rauschenbach
17:15 DS 26.9 Optical and transport properties of epitaxial Nd1.83Ce0.17CuO4 thin films — •Anita Guarino, Adolfo Avella, Carmela Bonavolontà, Massimo Valentino, Corrado Di Lisio, Loredana Parlato, Antonio Leo, Gaia Grimaldi, Sandro Pace, Giampiero Pepe, Antonio Vecchione, and Angela Nigro
17:30 DS 26.10 Significant Band Gap Narrowing of ALD Deposited ZnO:Al by Correlated Spectroscopic Ellipsometry, Photoluminescence and Spectrophotometry — •Michael Latzel, Manuela Göbelt, Gerald Brönstrup, Cornel Venzago, Sebastian W. Schmitt, and Silke H. Christiansen
17:45 DS 26.11 Detection of photoexcited hot charge carriers at the edges of metal nano films — •Marc Thomas, Steffen Franzka, Nils Hartmann, Detlef Diesing, Matthias Hensen, Dominik Differt, and Walter Pfeiffer
18:00 DS 26.12 Optical and electrical properties of silicon nanocrystals based on a SiH4-O2 PECVD process — •Jan Laube, Sebastian Gutsch, Daniel Hiller, and Margit Zacharias
18:15 DS 26.13 Comparison of Al2O3 passivation layers by RF magnetron sputtering and ALD deposition — •Franz P. G. Fengler, Daniel K. Simon, Paul M. Jordan, Thomas Mikolajick, and Ingo Dirnstorfer
18:30 DS 26.14 Real-time monitoring mof crystals *breathing* upon humidity guest loading — •Theodoros Baimpos, Buddha Ratna Shrestha, and Markus Valtiner
18:45 DS 26.15 Damping of metallized bilayer nanomechanical resonators at room temperature — •Maximilian Seitner, Katrin Gajo, and Eva Weig
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