Berlin 2015 – scientific programme

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DS: Fachverband Dünne Schichten

DS 27: Micro- and Nanopatterning

DS 27.1: Talk

Wednesday, March 18, 2015, 15:00–15:15, H 0111

Reactive sputter deposition of vertically oriented metal nitride nanopillar arrays — •Thilo Richter and Zoe H. Barber — University of Cambridge, Cambridge, United Kingdom

We have developed a method for fabricating porous, nano-columnar metal nitride thin film structures. Reactive DC magnetron sputtering from elemental targets is used with parameters which promote the formation of inter-grain voids by minimising the energy of sputtered species. The resulting structures have a wide range of applications. Conductive titanium nitride films can be used as electrodes in batteries and fuel cells. Similar TiN nanopillar arrays have been heat treated to form titanium oxynitrides and ultimately semiconducting oxides. Photocatalytic pollutant degradation under visible light has been demonstrated as one possible application of such oxides. Furthermore, electrochemical deposition within the inter-grain voids can result in extremely anisotropic structures.