Berlin 2015 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 3: Organic Thin Films

DS 3.7: Vortrag

Montag, 16. März 2015, 17:00–17:15, H 2032

Interface dipole and growth mode of partially and fully fluorinated rubrene on Au(111) and Ag(111) — Falk Anger¹, Hendrik Glowatzki², Antoni Franco-Cañellas¹, Christoph Bürker¹, •Alexander Gerlach¹, Reinhard Scholz³, Youichi Sakamoto⁴, Toshiyasu Suzuki⁴, Norbert Koch², and Frank Schreiber¹ — ¹Institut für Angewandte Physik, Universität Tübingen, 72076 Tübingen, Germany — ²Helmholtz-Zentrum für Materialien und Energie GmbH, Berlin, Germany — ³Institut für Angewandte Photophysik, TU Dresden, 01069 Dresden, Germany — ⁴Institute for Molecular Science, Myodaiji, Okazaki 444-8787, Japan

Thin films of fully and partially fluorinated rubrene deposited on Au(111) and Ag(111) were investigated using ultraviolet and X-ray photoelectron spectroscopy [1]. We demonstrate that fluorination of the molecules is an efficient way for tuning the metal-organic interface dipole and the hole injection barrier [2,3].

Moreover, the results indicate that the pronounced electrostatic dipole moment of partially fluorinated rubrene (F₁₄-Rub) has a strong impact on the growth mode of these molecules. Most notably, we infer that the first layer of F₁₄-Rub on Au(111) and Ag(111) is formed by molecules with alternating orientation of their dipole moments, whereas the second layer shows a nearly uniform orientation.
F. Anger et al., submitted
F. Anger et al., Appl. Phys. Lett. 102 (2013) 13308
M. Kytka et al., J. Chem. Phys. 130 (2009) 214507