Berlin 2015 – scientific programme
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DS: Fachverband Dünne Schichten
DS 36: Poster Session I
DS 36.38: Poster
Thursday, March 19, 2015, 09:30–12:00, Poster A
Characterisation of epitaxial Au(111) layers on H-terminated Si(111) using X-ray diffraction — Jubin Lirawi1, •Tim Wiegmann1, Martin Ruge1, Jochim Stettner1, and Olaf Magnussen1, 2 — 1Institut für Experimentelle und Angewandte Physik, Christian-Albrechts-Universität zu Kiel, Germany — 2Ruprecht Haensel Laboratory, Christian-Albrechts-Universität zu Kiel, Germany
The structure of ultrathin epitaxial Au(111) films electrochemically deposited on H-terminated Si(111) [1] was characterised by X-ray diffraction, aiming at applications of these films as substrates for ferromagnetic nanoscale structures. Specular scans and longitudinally diffuse scans have been used to determine the background-corrected surface reflectivity for three samples with a nominal thickness of 23, 33, and 65 monolayers, respectively. Layer thickness and roughness of the Au surface and Au/Si interface were calculated from these measurements, also taking into account substrate oxidisation close to the film. With a roughness of approximately 5 Å, the Au(111) film has been found to be very smooth, which makes the studied systems promising for future GISAXS studies. This finding is supported by rocking scans showing correlated roughness on a scale of 6300 Å. Measurements of six different Au Bragg peaks indicate a 180∘ rotation of the Au(111) relative to the substrate lattice. Future studies will analyse the Au(111)/electrolyte interface in situ using high X-ray energies and a transmission geometry.
[1] P. Prod’homme, F. Maroun, R. Cortès, P. Allongue: Appl. Phys. Lett. 93, 171901 (2008)