Berlin 2015 – scientific programme

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DS: Fachverband Dünne Schichten

DS 36: Poster Session I

DS 36.43: Poster

Thursday, March 19, 2015, 09:30–12:00, Poster A

Pulsed laser deposition of W-Cu thin films — •Arne Dittrich, Susanne Schlenkrich, Felix Schlenkrich, Florian Döring, Christian Eberl, and Hans-Ulrich Krebs — Institute for Materials Physics, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany

Pulsed laser deposition (PLD) is a versatile technique for the deposition of all kinds of different materials. At this, in many cases stoichiometry transfer between target and substrate is one of the unique features, but nevertheless, structural changes and deviations from stoichiometry can occur in systems with strong resputtering of one component due to occurrence of particles with energies up to 100 eV during PLD. In our case, the W-Cu alloy system with especially large different in masses of the constituents was chosen to test, how strong the film properties can be influenced by the deposition of energetic particles. For this study, elementary as well as allow targets were used. The thin film properties were studied using profilometry, x-ray diffraction (XRD), x-ray reflectivity (XRR), electron microscopy (SEM, EDX), with respect to structure, amount of allowing, and stoichiometry changes. First deposition experiments were also performed in gas atmosphere to look on the differences in film properties due to a reduction of the particle energy. In this contribution, the changes of film properties compared to the target and the dependence on the particle energy are presented.