Berlin 2015 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 36: Poster Session I
DS 36.52: Poster
Donnerstag, 19. März 2015, 09:30–12:00, Poster A
Diffuse Scattering from Multilayer Mirrors for EUV Lithography and the Water Window — •Anton Haase1, Saša Bajt2, Victor Soltwisch1, Christian Laubis1, and Frank Scholze1 — 1Physikalisch-Technische Bundestanstalt, Abbestr. 2-12, 10587 Berlin, Germany — 2Center for Free-Electron Laser Science/DESY, Notkestr. 85, 22609 Hamburg, Germany
Optical elements for the EUV and soft X-ray spectral range are of great interest for various scientific and technological applications. Today, the semiconductor industry is driving the development of high reflective multilayer coatings for the use with EUV light at a wavelength of 13.5 nm. On the other hand, soft X-rays in the so called water window spectral range between 2.3 nm and 4.4 nm can penetrate water with high attenuation lengths while being absorbed by the proteins. With the availability of coherent radiation of this wavelength, there is a new demand of high-reflectance mirrors in this spectral range.
We characterize high-reflectance Mo/Si and Cr/Sc multilayer mirrors with respect to interface roughness using scattering of EUV radiation of the respective wavelength near-normal incidence. The resulting intensity distribution of diffusely scattered light provides information on vertical and lateral correlations of roughness through the appearance of resonant diffuse scattering (RDS) sheets. It thus serves as a versatile tool for the investigation of interfacial roughness power spectral densities (PSD). We employ the distored-wave Born approximation to derive the roughness properties considering the impact of dynamic scattering processes on the diffuse scattering intensity.