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Berlin 2015 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 39: Poster Session II

DS 39.5: Poster

Donnerstag, 19. März 2015, 16:00–18:30, Poster F

Investigation of organic thin films of DIP and C60 mixtures using in situ X-ray diffraction techniques — •Heiko Frank, Christopher Lorch, Rupak Banerjee, Alexander Hinderhofer, Alexander Gerlach, and Frank Schreiber — Institut für Angewandte Physik, Universität Tübingen, Auf der Morgenstelle 10, 72076 Tübingen

Mixtures of organic semiconductors offer a variety of applications, including devices such as photovoltaic cells [1]. The optical and electronical properties of such devices depend inter alia on the structure of these mixtures and therefore on the preparation conditions [2,3]. Thus, understanding the structure of organic thin films is a key point for the optimization of such systems.

In this work, we investigate organic thin films consisting of mixtures of DIP and C60 with a molecular ratio of 1:1 on SiOx substrates. The films are prepared using organic molecular beam deposition (OMBD) and characterized in situ and in real-time [4] using X-ray reflectivity (XRR) and grazing incidence X-ray diffraction (GIXD). Our results indicate that the structural ordering of the mixed films has a strong dependence on the kinetics of the growth, which can be influenced by parameters like the temperature of the substrate, the total deposition rate and the growth type (continuous vs. interrupted growth).

[1] J. Wagner et al., Adv. Funct. Mater. 20, 4295 (2010) [2] A. Hinderhofer and F. Schreiber, ChemPhysChem 13, 628 (2012) [3] R. Banerjee et al., Phys. Rev. Lett. 110, 185506 (2013) [4] S. Kowarik et al., Europ. Phys. J. - Special Topics 167, 11 (2009)

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