Berlin 2015 – scientific programme

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HL: Fachverband Halbleiterphysik

HL 108: Graphene: Intercalation (O with HL/TT)

HL 108.1: Talk

Friday, March 20, 2015, 10:30–10:45, MA 041

Keeping Argon under a Graphene Lid - Argon intercalation between Graphene and Ni(111) — •Florian Späth, Karin Gotterbarm, Christoph Gleichweit, Max Amende, Udo Bauer, Oliver Höfert, Hans-Peter Steinrück, and Christian Papp — Physikalische Chemie II, Universität Erlangen-Nürnberg, Egerlandstraße 3, 91058 Erlangen, Germany

Graphene with its thickness of only one single atomic layer can be considered as the thinnest membrane or gas barrier. We present a spectroscopic investigation of related properties under well-defined ultra-high vacuum conditions in a surface science experiment: We implant argon into a Ni(111) crystal by sputtering prior to the growth of graphene. Subsequently, when growing graphene on Ni(111), argon diffuses out of the bulk and is caught underneath graphene. We investigate the system with high-resolution in-situ X-ray photoelectron spectroscopy. From the growth behavior of these intercalated argon bubbles during graphene preparation and from temperature programmed XP spectra we are able to deduce a model of the intercalation system (G/Ar/Ni) and estimate the pressure for argon under graphene. Furthermore, we find an increased thermal stability of graphene due to a decoupling of graphene from the Ni(111) substrate. This work was supported by SFB 953 "Synthetic Carbon Allotropes"