Berlin 2015 – scientific programme

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HL: Fachverband Halbleiterphysik

HL 9: Quantum dots: Optical properties

HL 9.1: Talk

Monday, March 16, 2015, 10:00–10:15, EW 203

Advanced in-situ elctron-beam lithography on pre-selected quantum dots by cathodoluminescence spectroscopy — •Arsenty Kaganskiy, Manuel Gschrey, Alexander Schlehahn, Jan-Hindrik Schulze, Ronny Schmidt, Tobias Heindel, Sven Rodt, André Strittmatter, and Stephan Reitzenstein — Institut für Festkörperphysik, Technische Universität Berlin, Hardenbergstraße 36, D-10623

Future quantum technology will rely crucially on the development of sources for indistinguishable and entangled photon pairs based on self-assembled quantum dots (QDs). To boost their photon extraction efficiency QDs need to be embedded in a precise and controlled way into photonic structures. In order to meet this requirement we developed and further advanced a deterministic technology platform named in-situ cathodoluminescence lithography (CLL) [1]. In the advanced CLL technique we are now able to fully characterize single QDs in a pre-registering process before integrating them with high alignment accuracy, e.g. into microlenses. The pre-characterization comprises measurement of the fine-structure splitting, time resolved luminescence, and second-order photon autocorrelation. Thus, advanced CLL combines the advantage of integrating individual QDs deterministically into nanostructures with a thorough pre- and post-characterization process. Within this scheme it is possible to directly evaluate the change in optical properties, e.g. in terms of the Purcell effect induced by the photonic structures.

[1] M. Gschrey et al., APL 102, 251113 (2013).