Berlin 2015 – scientific programme
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MA: Fachverband Magnetismus
MA 19: POSTER Ia
MA 19.33: Poster
Tuesday, March 17, 2015, 09:30–13:00, Poster A
Study of Spin flop transition in Fe/Cr multilayer grown on nanorippled Si substrate — •Sarathlal Koyiloth Vayalil1, Ajay Gupta2, and Stephan V. Roth1 — 1Photon Science, Deutsches Elektronen-Synchrotron, Notkestrasse-85, 22607, Hamburg, Germany — 2Amity Center for Spintronic Materials, Amity University, Sector 125, NOIDA, 201313, India
In this work, Fe/Cr giant magneto resistance multilayer prepared on nano-rippled Si (100) substrate has been studied. It has been demonstrated that, one can do a systematic study of spin flop transition in a polycrystalline films deposited on a nano-rippled substrate, by using the possibility of controlling the exchange field by varying the Cr spacer layer thickness and anisotropy field by varying the modulation depth of the ripples. The multilayer having a nominal structure [Fe (3.0 nm)/ Cr (1.0 nm)] x10 was deposited the nano-rippled Si substrate using electron beam evaporation. The multilayer exhibits a spin flop transition when magnetic field is applied in a direction along the easy axis. On the other hand when the field is applied normal to the easy axis, no spin flop transition is observed. This is in conformity with the theory of antiferromagnetic system. In our knowledge this is the first observation of spin flop transition in polycrystalline antiferromagnetically coupled multilayers.