Berlin 2015 – scientific programme

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MA: Fachverband Magnetismus

MA 19: POSTER Ia

MA 19.64: Poster

Tuesday, March 17, 2015, 09:30–13:00, Poster A

In-situ Polarised Neutron Reflectometry during Thin Film Growth by DC Magnetron Sputtering — Sina Mayr¹, Wolfgang Kreuzpaintner¹, Birgit Wiedemann¹, •Jingfan Ye¹, Andreas Schmehl², Thomas Mairoser², Alexander Herrnberger², Jean-Francois Moulin³, Jochen Stahn⁴, Panagiotis Korelis⁴, Martin Haese-Seiller³, Matthias Pomm³, Amitesh Paul¹, Peter Böni¹, and Jochen Mannhart⁵ — ¹Technische Universität München, Garching — ²Zentrum für elektronische Korrelation und Magnetismus, Universität Augsburg — ³Helmholtz Zentrum Geesthacht, Instrument REFSANS, Garching — ⁴Paul Scherrer Institut, Villigen PSI, Schweiz — ⁵Max Planck Institut für Festkörperforschung, Stuttgart

Since thin magnetic layers are used in many magneto-electronic devices the understanding of their texture and the coupling between them is essential to improve functionality. As these parameters are likely to change during the deposition process, in-situ polarised neutron reflectometry (PNR) is used to monitor the development of the structural and magnetic thin film properties during growth. We carry out in-situ PNR measurements using a specially designed sputtering chamber as sample environment combined with modern neutron optical elements at AMOR at PSI. In this contribution, the epitaxial growth of Fe and Cr on a Cu(100)/Si(100) substrate and the evolution of the magnetic properties, particularly the exchange coupling effects in a Fe/Cr heterostructure as a function of film thickness will be presented.