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MA: Fachverband Magnetismus

MA 52: Magnetic Thin Films II

MA 52.12: Vortrag

Freitag, 20. März 2015, 12:30–12:45, H 1012

An in-situ µGISAXS investigation of growth of magnetic nanowires on rippled Si substrates — •Sarathlal Koyiloth Vayalil¹, Ajay Gupta², Gonzalo Santoro¹, Peng Zhang¹, and Stephan V. Roth¹ — ¹Photon Science, Deutsches Elektronen-Synchrotron, Notkestrasse-85, 22607, Hamburg, Germany — ²Amity Center for Spintronic Materials, Amity University, Sector 125, NOIDA, 201313, India

Nanostructured magnetic thin films have gained significant relevance due to their applications in magnetic storage and recording media. Self-organized arrays of nanoparticles and nanowires can be produced by depositing metal thin films on nano-rippled substrates. The substrate topography strongly affects the film growth giving rise to anisotropic properties (optical, magnetic, electronic transport). Ion-beam erosion (IBE) allows for large area patterning of substrates and to tailor the pattern length scale by the ion beam parameters.

We investigated in real time the growth mechanism of magnetic thin films of Co and Permalloy thin films on such tailored nano-rippled Si (100) substrates using in-situ micro grazing incidence small-angle X-ray scattering (µGISAXS). In the very low thickness regime, the film replicates the morphology, rather an increase in the thickness lead to growth of nanowires in an orientation nearly 55⁰ from the surface. The annealing followed by the deposition generates large range ordered nanowires. We are able to correlate observed magnetic anisotropy with anisotropic nanostructure deduced from GISAXS.