Berlin 2015 – wissenschaftliches Programm
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MI: Fachverband Mikrosonden
MI 10: Poster: Microanalysis and Microscopy
MI 10.3: Poster
Mittwoch, 18. März 2015, 15:00–17:30, Poster B
Material sensitive coherent diffractive imaging employing a gas discharge plasma EUV source and phase grating for wavelength selection — •Raoul Bresenitz1, Jan Bußmann1, Denis Rudolf1, Michal Odstrcil2, Detlev Grützmacher1, and Larissa Juschkin1,3 — 1Peter Grünberg Institut 9, JARA-FIT,Forschungszentrum Jülich, 52425 Jülich, Germany — 2Optical Research Centre, University Southampton — 3RWTH Aachen University, Experimental Physics of EUV, JARA-FIT, Steinbachstrasse 15, 52074 Aachen, Germany
In diffraction limited microscopy, the resolution scales with the wavelength of the probe, which explains the current interest in EUV and X-ray microscopy. Moreover, many materials exhibit strong absorption edges in this spectral region, which results in elemental contrast. Coherent diffractive imaging (CDI) does not rely on conventional optics which map each point of the sample on a detector, but recovers the shape from its diffraction pattern using phase retrieval algorithms. Due to the required coherence, most CDI experiments were performed at synchrotron and free electron laser facilities. Only few laboratory based experiments, employing either a high harmonic or a soft X-ray laser source, were conducted so far. We discuss the feasibility and prospects of a gas discharge plasma EUV source for CDI experiments in general. In a second step, a phase grating for wavelength selection and monochromatisation will be used. We aim to combine high resolution and elemental contrast in the spectral range between 17 nm and 25 nm.