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MI: Fachverband Mikrosonden
MI 3: Analytical Scanning Electron Microscopy
Montag, 16. März 2015, 15:00–16:45, EMH 225
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15:00 | MI 3.1 | Hauptvortrag: Orientations, texture, properties - applications of electron backscatter diffraction — •Karsten Kunze |
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15:45 | MI 3.2 | Monte Carlo Simulations for Transmission Kikuchi Diffraction — •Nathanael Jöhrmann and Michael Hietschold |
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16:00 | MI 3.3 | A Mirror-Corrected Scanning Electron Microscope — •Peter Gnauck and Markus Boese |
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16:15 | MI 3.4 | Detecting the chemical shift of X-ray lines of Lithium, Boron and Carbon using a novel wave-length dispersive X-ray spectrometer — •Jürgen Heindl |
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16:30 | MI 3.5 | Quantitative EDS with focus on the nanometer scale for combinations of light and heavy elements. — •Meiken Falke, Igor Nemeth, Andi Kaeppel, and Ralf Terborg |