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MI: Fachverband Mikrosonden

MI 7: X-ray Imaging, Tomography and X-ray Optics

MI 7.4: Vortrag

Mittwoch, 18. März 2015, 10:15–10:30, EMH 225

Lithographically fabricated waveguides for x-ray coherent imaging — •Sarah Hoffmann, Hsin-Yi Chen, Henrike Neubauer, Mike Kanbach, and Tim Salditt — Röntgenphysik, uni-Göttingen, Friedrich-Hund Platz 1, 37077 Göttingen

Nanoscale x-ray sources as provided by x-ray channel waveguides enable a multitude of novel applications such as diffraction, high resolution spectroscopy, microscopy and holography [1,2]. We report on imaging experiments and the fabrication process of these hard x-ray waveguides deployed at the synchrotron sources at DESY and ESRF. Among other techniques e-beam lithography, reactive ion etching and Silicon wafer bonding are involved within the fabrication of two-dimensional, sub-100 nm sized waveguide channels. Both waveguide geometry and material can be adapted to meet the requirements of a specific experiment, such as the photon energy (7.9-17.5 keV), the desired source size, or the application of a reference beam in a holography setup. As the tunability of the optical properties provided by the waveguides, such as the coherence of the beam, its divergence or the waveguide transmission, depends sensitively on the precise control over the (several) process steps, an iterative process of diagnostics and optimization is essential.
A. Jarre et al., Phys. Rev. Lett. 94, 074801 (2005)
C. Krywka et al., J. Appl. Cryst. 45, 85-92 (2012)
A. Kohlstedt et al., Appl. Phys. A 91, 6-12 (2008)
H. Neubauer et al., J. Appl. Phys. 115, 214305 (2014)