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MM: Fachverband Metall- und Materialphysik

MM 14: Transport I: Diffusion

MM 14.5: Vortrag

Montag, 16. März 2015, 17:00–17:15, H 0107

Microstructure and Stress Relaxation in Thin Nano Crystalline Platinum Films — •Wolfgang Gruber¹, Florian Strauß¹, Lars Dörrer¹, Michael Horisberger², Thomas Geue², Jochen Stahn², Carsten Bähtz³, and Harald Schmidt¹ — ¹TU Clausthal, Institut für Metallurgie — ²Paul Scherrer Institut, Laboratory for Neutron Scattering — ³Helmholtz-Zentrum Dresden-Rossendorf, Institut für Ionenstrahlphysik und Materialforschung

Various techniques can be used to deposit thin metal films with a thickness in the nanometer range on a substrate. Independent of the method of production residual stress is present in the metal films after deposition. Based on the concept of dilatometry X-ray diffraction and X-ray reflectometry was used to investigate the correlation of strain relaxation and the change of point defect concentration in thin Pt films [1]. In the present work in-situ measurements using synchrotron radiation were performed in the temperature range between 100 °C and 300 °C to investigate strain relaxation in thin Pt films deposited on oxidised silicon substrates via magnetron sputtering and ion beam sputtering, respectively. Self-diffusion of Pt was investigated for samples produced by ion beam sputtering using secondary ion mass spectrometry and neutron reflectometry. The two systems are compared taking the microstructure as revealed by X-ray analysis into account.

W. Gruber, S. Chakravarty, C. Baehtz, W. Leitenberger, M. Bruns, A. Kobler, C. Kübel, H. Schmidt, Phys. Rev. Lett. 117 (2011) 265501.