Berlin 2015 – wissenschaftliches Programm
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MM: Fachverband Metall- und Materialphysik
MM 17: Postersession I
MM 17.20: Poster
Montag, 16. März 2015, 18:00–20:00, Poster E
Potential-strain coupling during hydrogen electroabsorption — •Shan Shi1, Tobias Kitzler1, Qibo Deng2, Jürgen Markmann1,2, and Jörg Weissmüller1,2 — 1Helmholtz-Zentrum Geesthacht, Insitut für Werkstoffforschung, Werkstoffmechanik — 2Technische Universität Hamburg-Harburg, Institut für Werkstoffphysik und Werkstofftechnologie
The recent past has seen an increasing interest in the impact of mechanical deformation on the electrode processes. The effect is measured by the potential-strain coupling coefficient (ς) which quantifies the variation of the electrode potential, with tangential strain. In this study, we use dynamic electro-chemo-mechanical analysis (DECMA) to determine the potential-strain coupling during hydrogen electroabsorption into a Palladium (Pd) thin film. The samples are prepared by DC magnetron sputtering of a nanometer thick Pd film, which contains many grain boundaries, on a polyimide substrate. We monitor the electrochemical behaviour of the Pd thin film in aqueous electrolytes during imposing periodical elastic strain on the sample. Additionally, another customised in-situ electrochemical cell enables us to determine microstructural information of the Pd film such as the lattice parameter by in-situ X-ray diffraction. By combining the results, the question how the mechanical strain affects the storage of light interstitials (H) in Pd and the kinetics of the adsorption or dissolution at the electrode surface and the absorption in the grain boundaries and the bulk will be explored.