Berlin 2015 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
MM: Fachverband Metall- und Materialphysik
MM 17: Postersession I
MM 17.7: Poster
Montag, 16. März 2015, 18:00–20:00, Poster E
Hydrogen-induced stress in ultrathin Nb-Fe Films — •Philipp Klose1, Magnus Hamm1, Helmut Klein2, and Astrid Pundt1 — 1Universität Göttingen, Institut für Materialphysik, Friedrich-Hund-Platz 1, 37077 Göttingen — 2Geowissenschaftliches Zentrum Göttingen, Goldschmidtstr. 1-3, 37077 Göttingen, Germany
Hydrogen which is located in interstitial lattice sites, is an origin for compressive mechanical stresses in thin films[1,2,3]. For low hydrogen concentrations, the in-plane film stress increases linearly on the hydrogen content.[3] Above a hydrogen-related yield stress the films deform plastically[4]. In this study, the hydrogen-induced stress development in niobium-iron (Nb90-Fe10) films is examined. The focus is on the thickness dependency of the stress development and the determination of the yield stress in these films.
The films of 3 nm - 40 nm were prepared by argon-cathode beam sputtering. They were studied by XRR-measurements to determine the exact film thickness. For selected samples the texture of the Nb-Fe films was determined by XRD to evaluate their epitaxial growth. Hydrogen loading was performed from the electrolyte using constant current conditions. The hydrogen concentration was determined via Faraday’s law. The hydrogen-related yield stress is found to be strongly thickness dependent, in the thickness range studied.
[1] J. Weissmuller and C. Lemier, Philos. Mag. Lett. 80:6 (2000) [2] S. Wagner and A. Pundt, Appl. Phys. Lett. 92.5 (2008) [3] U. Laudahn et al., JALCOM 293-295 (1999) [4] A. Pundt, et al., Phys. Rev. B 61.15 (2000)