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MM: Fachverband Metall- und Materialphysik
MM 28: Poster Session II
MM 28.21: Poster
Dienstag, 17. März 2015, 18:30–20:30, Poster E
Simulation of Nanocolumn Formation in a Plasma Environment — •Jan Willem Abraham1, Thomas Strunskus2, Franz Faupel2, and Michael Bonitz1 — 1Institut für Theoretische Physik und Astrophysik, CAU Kiel — 2Institut für Materialwissenschaft, CAU Kiel
Recent experiments and kinetic Monte Carlo (KMC) simulations [1,2] demonstrated that
physical vapor co-deposition of a metal alloy (Fe-Ni-Co) and a polymer (Teflon AF)
can lead to self-organized growth of magnetic nanocolumns. While these experiments
have been carried out with thermal sources, we
analyze the feasibility of this process for the case
of a sputtering source. For that purpose, we extend our previous simulation model by including a
process that takes into account the influence of ions impinging on the substrate [3].
The simulation results predict that metal
nanocolumn formation should be possible. Furthermore we show that
the effect of ions, which create trapping sites for the metal particles,
is an increased number of nanocolumns.
H. Greve et al., Appl. Phys. Lett. 88, 123103 (2006)
L. Rosenthal et al., J. Appl. Phys. 114, 044305 (2013)
J.W. Abraham et al., submitted to J. Appl. Phys. (2014)