Berlin 2015 – scientific programme

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O: Fachverband Oberflächenphysik

O 35: Nanostructures at Surfaces

O 35.14: Poster

Tuesday, March 17, 2015, 18:15–21:00, Poster A

SiOx nanoparticles generation in the gas phase by pulsed DC magnetron sputtering — •Oleksandr Polonskyi, Egle Vasiliauskaite, Thomas Strunskus, and Franz Faupel — Institute for Materials Science, Chair for Multicomponent Materials, Christian-Albrechts University at Kiel, Kaiserstr. 2, 24143 Kiel, Germany

Nanoparticles and their composites have received an increasing attention in the last few decades due to their unique chemical, physical, mechanical, electrical, and optical properties, which provide hosts of potential applications in modern technology. Si-based nanomaterials are in particular interest. In this work we utilize such called gas aggregation cluster sources (GAS), based on the magnetron sputtering, for fabrication of SiOx nanoparticles. We observed that a low concentration of oxygen is necessary to admix for the cluster formation process. It was shown that a gas aggregation source based on pulsed reactive DC magnetron sputtering gives rise to a high increase in deposition rate of nanoparticles compared to continuous operation. The focus of the contribution is on nanoparticles size control and cluster growth and transport mechanism in the GAS. The influence of experimental conditions (Ar pressure/flow, discharge parameters, oxygen admixture) on nanoparticles size was investigated. The prepared nanoparticles were characterized with regard to chemical composition, morphology and optical properties.