Berlin 2015 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 63: 2D Materials beyond Graphene

O 63.5: Poster

Mittwoch, 18. März 2015, 18:15–21:00, Poster A

Growth and characterization of thin MoS2 layers by CVD — •Gregor Nordheim, Martina Wanke, Adrian Schütze, Florian Speck, and Thomas Seyller — Institut für Physik, TU Chemnitz, Reichenhainer Str. 70, D-09126 Chemnitz, Germany

MoS2 is a two-dimensional layered material like graphene, with a hexagonal structure and weak van der Waals forces between the layers. In contrast to graphene, MoS2 has a band gap which makes it an interesting material for electronic and optoelectronic applications. Chemical vapor deposition (CVD) is a promising approach to synthesize uniform, high quality monolayer and few layer MoS2 films on various substrates such as silicon oxide, sapphire [1-3].

We report on the growth and characterization of MoS2 using a custom build CVD setup. Epitaxial monolayer graphene and the buffer layer on SiC(0001) synthesized by sublimation growth in Ar [4] were used as substrates. The samples were analyzed by X-ray photoelectron spectroscopy (XPS) in order to obtain information about their chemical composition and the thickness of the layers. In addition, the MoS2 layers were studied by atomic force microscopy (AFM).

[1] Y. Yu et al., Scientific Rep. 3 (2013) 1866. [2] M.R. Laskar et al., Nat. Mater. 102 (2013) 252108. [3] Y.-H. Lee et al., Nano Lett. 13 (2013) 1852. [4] K.V. Emtsev et al., Nat. Mater. 8 (2009) 203.