Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
O: Fachverband Oberflächenphysik
O 64: New Methods
O 64.7: Poster
Mittwoch, 18. März 2015, 18:15–21:00, Poster A
Investigation of glass degradation by X-ray Photoelectron spectroscopy — •Stephanie Reiß1, Stefan Krischok1, Sabine Urban2, and Edda Rädlein2 — 1Institut für Physik and Institut für Mikro- und Nanotechnologien, TU Ilmenau, PF 100565, 98684 Ilmenau, Germany — 2Institut für Werkstofftechnik, TU Ilmenau, Postfach 100565, 98684, Ilmenau, Germany
Changes in the surface chemical composition during glass degradation were studied by X-ray photoelectron spectroscopy. The samples were manufactured in a float process in which the glass melt is formed on a liquid tin bath leading to a surface with tin enrichment (bath side) and one without (air side). Both sides of fresh and aged glasses were analyzed. The evaluation of the measured O1s core level spectra reveals two components: one at 532eV related to bridging oxygen (BO) linking two silicons and one at 530.3eV related to negatively charged non-bridging oxygen (NBO) where one silicon is substituted by a positive alkali ion. The changes in the ratio of these O1s components give insight in the progress of network dissolution. For the bath side the BO/NBO-ratio decreases from 10.8 to 2.2 after aging. While the fresh sample's air side shows clearly the BO and NBO component with a ratio of 4.9, the seasoned air side exhibits only one signal. Its FWHM is wider than for each single component of the fresh sample and its binding energy lies with 531.6eV in between them leading to the conclusion that both components are almost equal in intensity and hence superimpose to each other. The stronger degradation of the air side hence points to an anticorrosive effect of tin.