Berlin 2015 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 82: Nanostructure at Surfaces: Dots and Clusters

O 82.9: Vortrag

Donnerstag, 19. März 2015, 12:30–12:45, MA 043

Deposition of Ti nanoclusters by Gas Aggregation Source and HiPIMS — •Oleksandr Polonskyi, Waqas Saddique, Alexander Hinz, Thomas Strunskus, and Franz Faupel — Institute for Materials Science, Chair for Multicomponent Materials, Christian-Albrechts University at Kiel, Kaiserstr. 2, 24143 Kiel, Germany

Metal nanoparticles have been of high scientific interest in the last decades as they are intermediate objects between single atoms or molecules and solid matter and have unique chemical, physical, electrical, magnetic and optical properties. Nanocluster and nanoparticle production in the gas phase and their deposition have been extensively investigated within the last three decades using various cluster sources. In our work we focus on deposition of Ti (TiOx) nanoparticles using magnetron based Gas Aggregation cluster Source (GAS) in combination with High Power Impulse Magnetron Sputtering (HiPIMS) discharge. First, Ti sputtering at relatively high working pressure (100-200Pa) using HiPIMS was studied in details. With regard to nanoparticles deposition, it was observed that the utilization of HiPIMS discharge allows, at certain window parameters, generation of pure Ti nanoparticles without oxygen admixture, what was not possible with conventional DC magnetron sputtering. The purity of prepared films was studied by XPS immediately after deposition. In case of reactive HiPIMS, high deposition rate of TiOx nanoparticles was achieved. The effect of HiPIMS parameters on nanoparticles deposition rate, their size and chemical composition was investigated. It was shown that size can be controlled in range 5-25 nm.