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P: Fachverband Plasmaphysik

P 26: Plasma Technology III

P 26.4: Vortrag

Donnerstag, 5. März 2015, 14:45–15:00, HZO 50

Global model of deposition plasmas fed with an oxygen admixture — •Efe Kemaneci — Institute for Theoretical Electrical Engineering, Department for Electrical Engineering and Information Technologies, Ruhr University Bochum, D-44780 Bochum, Germany

The plasma deposition is used in many processes ranging from the manufacture of optical fibers to the production of solar cells. In these processes, the plasma converts chemically inactive species to the deposition material. Beside many other physical phenomena occurring in the system, the chemical kinetics plays a vital role for the application. Since detailed models of such processes are numerically expensive, global (volume-averaged) models are often preferred to investigate such plasmas. In this contribution we investigate oxygen plasmas, which is one of the main ingredient in deposition processes, via global models. We validate the model by benchmarking against experimental data on various oxygen plasmas in literature with continuous as well as pulsed power coupling. As a preliminary step, we further investigate a plasma chamber fed with an admixture of O2/SiCl4 used in the optical fiber production.