Regensburg 2016 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 46: Poster: Wetting, Nano- and Microfluidics
CPP 46.14: Poster
Mittwoch, 9. März 2016, 18:15–21:00, Poster B2
Wetting properties of n-alkane nanostructures — •Diego Diaz1, Tomas Corrales2, Maria Retamal1,3, Marcelo Cisternas1, Patrick Huber4, and Ulrich Volkmann1 — 1Centro de Investigación en Nanotecnología y Materiales Avanzados, CIEN-UC, Pontificia Universidad Católica de Chile, Santiago, Chile — 2Instituto de Alta Investigación, Universidad de Tarapacá, Arica, Chile — 3Facultad de Química, Pontificia Universidad Católica de Chile, Santiago, Chile — 4Materials Physics, Hamburg U. of Technology, D-21073 Hamburg, Germany
Recently, we have shown that it is possible to modify the surface coverage and morphology of an n-alkane molecular layer over silicon by controlling the withdrawal velocity of the substrate from solution (T.P. Corrales et al., ACS Nano 8, 9954-9963, 2014). As a follow-up work, we study here the wetting properties of silicon surfaces coated with molecular layers of n-alkane as a function of the surface coverage and morphology, using a drop shape analysis procedure. We have found from our measurements that both the coverage and morphology of the underlying nanostructures affects the contact angle of the surface. In particular, stripe-like structures present lower contact angles than dendritic structures that have roughly the same coverage and thickness. All films consist of a single n-alkane molecular layer with a height of around 5 nm. Furthermore, we find differences in the contact angles measured parallel and perpendicular to the withdrawal direction of the substrate from solution.