Regensburg 2016 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 12: Postersession DS

DS 12.4: Poster

Montag, 7. März 2016, 17:00–19:00, Poster A

Texture Optimization of the Binary Compound Sb₂Te₃ by Using UHV DC Magnetron Sputter Deposition — •Artur Romanov, Carolin C. Jacobi, Matthias M. Dück, and Matthias Wuttig — I. Institute of Physics (IA), RWTH Aachen University, Aachen, Germany

The binary compound Sb₂Te₃ exhibits extraordinary thermoelectric properties. These are desirable for a range of industrial applications, e.g. for solid state refrigerators. Additional to its applicability, Sb₂Te₃ is of high fundamental scientific interest since it was identified as a topological insulator (TI). In order to develop the surface states, that enable the topological properties, a high texture quality of the deposited thin film is needed. Highly textured films are usually produced with elaborate methods like Molecular Beam Epitaxy (MBE). However, recently textured films were successfully produced using the sputter deposition method. In contrast to MBE, sputter deposition offers benefits for industrial applications like convenient scalability and high deposition rates. The choice of process parameters was found to influence the quality of the deposited thin film heavily. Accompanied by the growth type, changes can occur in texture and electrical properties. The limit of texture optimization is not yet achieved and requires further investigation. Goal of this project is to establish an efficient and fast method to produce Sb₂Te₃ in a texture similar to MBE. The film’s texture is determined by x-ray diffraction (XRD), in particular employing measurements of Rocking Curves and measurements using Bragg-Brentano geometry.