Regensburg 2016 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 12: Postersession DS

DS 12.41: Poster

Montag, 7. März 2016, 17:00–19:00, Poster A

Secondary Ion Mass Spectrometry (SIMS) in Helium and Neon Ion Microscopy — David Dowsett, •Florian Vollnhals, Jean-Nicolas Audinot, and Tom Wirtz — Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg

Helium Ion Microscopy (HIM) was introduced a few years ago as an imaging tool with a lateral resolution below 1 nm. The addition of Neon as a working gas in the Orion NanoFab (Zeiss) has opened up new possibilities in high resolution nano-machining and FIB applications.

We developed instrumentation to combine the HIM with Secondary Ion Mass Spectrometry (SIMS). In SIMS, the sample is sputtered by a primary beam, e.g., the highly focused He or Ne ion beam of a HIM, while the secondary ion emission is recorded. This combination takes advantage of both probe size of the He/Ne beam and sensitivity of the SIMS analysis, allowing for high resolution correlative microscopy. In addition, the HIM-SIMS combination has very promising prospects regarding in-situ process control during nano-machining.

We will discus instrumental and method development, including theoretical and experimental aspects, e.g., He and Ne ion beam interaction with sample surfaces.[1] He and Ne ion beams will be shown to be viable primary species for successful imaging SIMS, approaching the physical resolution limits of <20 nm.[2]

[1] D. Dowsett et al., J. Vac. Sci. Technol. B 30 (2012), 06F602

[2] T. Wirtz et al., Nanotechnology 26 (2015), 434001