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DS: Fachverband Dünne Schichten
DS 12: Postersession DS
DS 12.43: Poster
Montag, 7. März 2016, 17:00–19:00, Poster A
Intense Electrospray Ionization Sources/Atmospheric Pressure Interfaces for Ion Beam Deposition — •Stephan Rauschenbach1, Laurent Bernier2, Matthias Pauly3, and Julius Reiss2 — 1Max-Planck-Institute for Solid State Research, Stuttgart, Germany — 2Technical University Berlin, Germany — 3University Strasbourg, ICS-CNRS, France
Reactive or soft-landing molecular ion beam deposition requires high fluence ion beams, which present soft ionization sources, such as electrospray ionization (ESI), cannot deliver. In principle, electrospray ionization can generate ion currents in the microamp range, however, the ion transport in the atmospheric interface, i.e. the transfer of ions trough a capillary or pinhole from atmospheric pressure to vacuum, is extremely inefficient. The particle transport is governed by electric forces, diffusion and by the flowing background gas. The gas flow can be laminar or turbulent and is strongly compressible. Its interplay with ions can strongly influence the efficiency of the source, which is however not fully understood. We present the experimental and numerical analysis of the ion transport behavior in a confined, flowing gas and show that highly efficient ion sources can be conceived.