Regensburg 2016 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 16: Layer Properties: Electrical, Optical, and Mechanical
DS 16.7: Vortrag
Dienstag, 8. März 2016, 11:00–11:15, H11
Study of the properties of sputtered ZnO:Al layers on ultra-thin glass — •Jasper Westphalen1,2, Manuela Junghähnel1, and Edda Rädlein2 — 1Fraunhofer Institute for Organic Electronics, Electron Beam and Plasma Technology FEP — 2Technische Universität Ilmenau
Ultra-thin glass is a new type of transparent and flexible substrate material. It is a glass with a thickness less than 200 μm. The many advantageous properties, such as the excellent barrier to water and oxygen and the temperature stability up to 700 °C open up new possibilities for transparent electronics, display technology and in photovoltaics. Transparent conductive oxide (TCO) can be used for different functional layers for these topics. As an alternative to the expensive indium doped tin oxide (ITO) aluminum doped zinc oxide ZnO:Al is already used in some devices. In this study, ZnO:Al films were deposited by magnetron sputtering on ultra-thin glass. The influence of the deposition power on the electrical, optical and mechanical properties of the films were investigated. In order to improve the optical and the electrical properties, we used flash lamp annealing (FLA) as a post-deposition annealing method for ultra-short thermal treatment in the millisecond range.