Regensburg 2016 – scientific programme
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DS: Fachverband Dünne Schichten
DS 28: Thin Film Applications
DS 28.4: Talk
Wednesday, March 9, 2016, 10:30–10:45, H8
Hard X-Ray Microscopy with Multilayer Zone Plates — •Christian Eberl1, Florian Döring1, Markus Osterhoff2, Tim Salditt2, and Hans-Ulrich Krebs1 — 1Institut für Materialphysik, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany — 2Institut für Röntgenphysik, University of Göttingen, Friedrich-Hund-Platz 1, 37077 Göttingen, Germany
X-ray microscopy is due to the small wavelength and high penetration depth an auspicious technique for improved investigations of materials on nm-scale. For this, multilayer zone plates (MZP) with well-defined and smooth multilayers of low thickness grown on wires are promising optical elements. The combination of pulsed laser deposition (PLD) and focused ion beam (FIB) has been proven to be extraordinarily suitable for the fabrication of MZPs and we could demonstrate a sub-5nm hard x-ray focus [1,2]. In order to make those MZPs applicable for nanoscopy basically a larger overall multilayer thickness is required. For this, a deep understanding of the underlying processes (such as target changes as well as resputtering and backscattering during film growth) is essential. Hence, detailed investigations have been carried out using complementary methods such as X-ray diffraction (XRD), X-ray reflectivity (XRR), transmission electron microscopy (TEM) in cross section as well as SDTrimSP simulations. Here we present our latest results demonstrating that a compound optics (formed by Kirkpatrick-Baez mirrors and a high quality MZP) is usable for microscopy applications.
[1] Döring et al., Opt. Expr. 21 (2013); [2] Eberl et al., Appl. Surf. Sci. 307 (2014)