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Regensburg 2016 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 35: Thin Film Characterisation: Structure Analysis and Composition II

DS 35.6: Vortrag

Mittwoch, 9. März 2016, 16:15–16:30, H8

Sample thickness in Transmission Kikuchi Diffraction via Monte Carlo Simulations — •Nathanael Jöhrmann and Michael Hietschold — Institut für Physik, TU Chemnitz, Deutschland

Transmission Kikuchi Diffraction in a Scanning Electron Microscope is an interesting modification of Electron Backscatter Diffraction to get information about crystalline structures with high spatial resolution [1]. The achievable lateral resolution and the measurement time depend strongly on several parameters, particularly on sample thickness, sample tilt and acceleration voltage. To better understand measurement results, especially unindexed areas, and to optimize sample preparation and TKD setup, it would be helpful to get information about sample thickness as additional information of a measurement. To achieve this, the background signal of measured diffraction patterns is compared with Monte Carlo simulations.

[1] R. R. Keller und R. H. Geiss, Journal of Microscopy 245 (2011), pp. 245-251

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