Regensburg 2016 – scientific programme

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DS: Fachverband Dünne Schichten

DS 52: Ion and Electron Beam Induced Processes

DS 52.5: Talk

Thursday, March 10, 2016, 18:00–18:15, H11

Properties of TiO2 films grown by reactive ion beam sputter deposition — •Thomas Lautenschläger, Eric Thelander, Daniel Spemann, and Carsten Bundesmann — Leibniz-Institut für Oberflächenmodifizierung, Permoserstr. 15, 04318 Leipzig

Ion beam sputter deposition is a versatile technique for tailoring thin film properties as it provides several ways of varying the properties of the film-forming, secondary particles. TiO2 films were deposited by reactive ion beam sputter deposition under systematic variation of ion beam and geometrical parameters. The films were characterized concerning thickness, growth rate, structural properties, mass density, composition and optical properties. Film thickness and growth rate show an over-cosine angular distribution that is tilted in forward direction. The growth rate was found to increase with increasing ion energy and ion incidence angle, which can be explained by the known dependence of the sputter yield. The TiO2 films are amorphous and show systematic variations in the mass density and index of refraction. Mass density and index of refraction reveal a strong correlation. The systematic variations in mass density and index of refraction are assigned to the properties of the backscattered primary particles. Furthermore, a considerable amount of primary particles was found in the films. The atomic fraction of inert gas particles depends on the scattering geometry, i.e. it increases with increasing sum of ion incidence angle and polar emission angle, but seems to be unaffected by the ion energy.