Regensburg 2016 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 53: Postersession DS/HL
DS 53.24: Poster
Donnerstag, 10. März 2016, 16:00–19:00, Poster A
Surface morphology of vapor deposited chitosan thin films — •Maria Jose Retamal1,3, Tomas Corrales2, Marcelo Cisternas3,6, Nicolas Moraga3,6, Sebastian Gutierrez4, Tomas Perez-Acle4, Patrick Huber5, and Ulrich Volkmann3,6 — 1Facultad de Química, PUC, Santiago, Chile — 2IAI Universidad de Tarapacá, Arica, Chile — 3CIEN-UC, Santiago, Chile — 4DLab, Fundación Ciencia y Vida, Santiago, Chile — 5Hamburg U. of Technology, D-21073 Hamburg, Germany. — 6Instituto de Física, PUC, Santiago,Chile
Chitosan is a useful biopolymer with several industrial and biological applications. In spite of the many applications of chitosan, there is a lack of studies regarding the morphology and growth mechanisms of thin films of this biopolymer. We present a study of thin chitosan films prepared using PVD with in-situ ellipsometric monitoring. The prepared films are studied using AFM in order to correlate surface morphology with evaporation parameters. We find that the surface morphology of our final thin films depends both on the ellipsometric optical thickness as well as the evaporation rate. We find the correct evaporation parameters in order to obtain homogeneous thin films of chitosan, which are relevant for future chitosan based nano-devices. AFM images on samples prepared as a function of film thickness at constant evaporation rate, as well as AFM topographies of samples prepared as a function of evaporation rate for reaching identical film thickness show both very strong similarities to images reported as spinodal dewetting of thin metal and polymer films as a function of temperature.