DS 8: Thin Film Characterisation: Structure Analysis and Composition I
Montag, 7. März 2016, 15:00–16:30, H8
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15:00 |
DS 8.1 |
Hauptvortrag:
Materials characterization at the nanoscale by X-ray spectrometry — •Burkhard Beckhoff
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15:30 |
DS 8.2 |
Determination of growth quality of thin films by In-situ GISAXS during the deposition process — •Jörg Wiesmann, Peter Siffalovic, Karol Vegso, and Martin Hodas
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15:45 |
DS 8.3 |
Real-Time Investigation at Metal-Polymer-Interfaces during Sputter Deposition. — •Matthias Schwartzkopf, Oleksandr Polonskyi, Alexander Hinz, Thomas Strunskus, Franziska Löhrer, Volker Körstgens, Peter Müller-Buschbaum, Franz Faupel, and Stephan V. Roth
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16:00 |
DS 8.4 |
Ion beam sputter deposition (IBSD) of cubic MgO and NiO — •Martin Becker, Robert Hamann, Mario Gies, Fabian Michel, Angelika Polity, and Martin Eickhoff
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16:15 |
DS 8.5 |
Determing the optical constants of NiO with Resonant X-Ray Reflectivity — •Katrin Fürsich, Volodymyr B. Zabolotnyy, Christian Schüßler-Langeheine, Maurits W. Haverkort, and Vladimir Hinkov
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