Regensburg 2016 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 35: Poster I

HL 35.13: Poster

Dienstag, 8. März 2016, 15:00–19:00, Poster A

Weak Anti-Localization and Bulk-Surface-Correspondence in Topological Insulators — •Sebastian Hutsch and Frank Ortmann — Institute for Materials Science and Dresden Center for Computational Materials Science, TU Dresden, Germany

Topological Insulators have drawn considerable attention in solid state physics in recent years, also leading to investigations of their properties by the means of simulations. Effective models for isolated surface states of 3D TIs have been used to describe experimentally studied phenomena like Weak Anti-Localization of such states. Beyond that, an influence of the bulk states on transport properties as observed in experiment could not be modeled accurately because a full 3D model of the topological insulators (including both, bulk and surface) is needed for realistic simulations.

In this work, the Fu-Kane-Mele model, a 3D generalization of the Quantum-Spin-Hall system graphene, is used for the transport simulations in the Kubo framework, where we study localization behaviour for the strong topological phase and weak disorder.