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HL: Fachverband Halbleiterphysik

HL 90: Poster III

HL 90.10: Poster

Donnerstag, 10. März 2016, 16:00–19:00, Poster A

Laser-induced shockwave delamination: A non-thermal structuring method of functional thin films — •Pierre Lorenz¹, Tomi Smausz^2,3, Tamas Csizmadia², Lukas Bayer¹, Martin Ehrhardt¹, Klaus Zimmer¹, and Bela Hopp² — ¹Leibniz-Institut für Oberflächenmodifizierung e. V., Permoserstraße 15, 04318 Leipzig, Germany — ²Department of Optics and Quantum Electronics, University of Szeged, H-6720 Szeged, Dóm tér 9, Hungary — ³MTA-SZTE Research Group on Photoacoustic Spectroscopy, University of Szeged, H-6720 Szeged, Dóm tér 9, Hungary

Shock-wave-induced film delamination (SWIFD) as non-thermal laser patterning process enables a gentle film removal and offers therefore a great potential for application. At the SWIFD, the localized removal of the functional thin films is induced by a shock wave which is produced by a laser ablation with 25 ns and 248 nm laser pulses applied to the rear side of the substrate. Different film / substrate combination was tested e.g. copper indium gallium selenide (CIGS) solar cell stacks on polyimide and steel carrier foil and indium tin oxide (ITO) on polyethylene terephthalate (PET). The morphology and the composition of the structures were analysed by optical and scanning electron microscopy (SEM) and by energy-dispersive X-ray spectroscopy (EDX), respectively. Furthermore, the mechanism of SWIFD was analyzed by shadowgraph experiments and this will allow improvements of the physical understanding, modelling and process optimization.