Regensburg 2016 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 92: Postersession DS/HL

HL 92.24: Poster

Donnerstag, 10. März 2016, 16:00–19:00, Poster A

Surface morphology of vapor deposited chitosan thin films — •Maria Jose Retamal^1,3, Tomas Corrales², Marcelo Cisternas^3,6, Nicolas Moraga^3,6, Sebastian Gutierrez⁴, Tomas Perez-Acle⁴, Patrick Huber⁵, and Ulrich Volkmann^3,6 — ¹Facultad de Química, PUC, Santiago, Chile — ²IAI Universidad de Tarapacá, Arica, Chile — ³CIEN-UC, Santiago, Chile — ⁴DLab, Fundación Ciencia y Vida, Santiago, Chile — ⁵Hamburg U. of Technology, D-21073 Hamburg, Germany. — ⁶Instituto de Física, PUC, Santiago,Chile

Chitosan is a useful biopolymer with several industrial and biological applications. In spite of the many applications of chitosan, there is a lack of studies regarding the morphology and growth mechanisms of thin films of this biopolymer. We present a study of thin chitosan films prepared using PVD with in-situ ellipsometric monitoring. The prepared films are studied using AFM in order to correlate surface morphology with evaporation parameters. We find that the surface morphology of our final thin films depends both on the ellipsometric optical thickness as well as the evaporation rate. We find the correct evaporation parameters in order to obtain homogeneous thin films of chitosan, which are relevant for future chitosan based nano-devices. AFM images on samples prepared as a function of film thickness at constant evaporation rate, as well as AFM topographies of samples prepared as a function of evaporation rate for reaching identical film thickness show both very strong similarities to images reported as spinodal dewetting of thin metal and polymer films as a function of temperature.