Regensburg 2016 – wissenschaftliches Programm
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MA: Fachverband Magnetismus
MA 17: Poster Session I
MA 17.21: Poster
Dienstag, 8. März 2016, 09:30–12:30, Poster B1
Application of He-ion microscopy for advanced light-ion induced magnetic patterning of exchange bias layer systems — •Alexander Gaul1, Nicolas Müglich1, Daniel Emmrich2, André Beyer2, Johanna Hackl3, Hatice Doganay3, Slavo Nemsak3, Armin Gölzhäuser2, and Arno Ehresmann1 — 1Department of Physics & CINSaT, University of Kassel — 2Physics of Supramolecular Systems and Surfaces, University of Bielefeld — 3PGI-6, FZ-Jülich
Light-ion bombardment induced magnetic patterning (IBMP) of exchange bias (EB) bilayer systems by Helium ions through a sha-dow mask is a well-known technique to locally tailor the magnetic anisotropy on the micrometer length scale. Here we demonstrate the use of Helium ion microscopy (HIM) for the fabrication of artificial magnetic domains in EB systems without shadow masks. In this way, magnetic domain patterns with lateral dimensions on nano meter scales become feasible. Therefore, designed magnetic domain patterns were written by a He ion beam of 10 nm diameter into the continuous EB layer. The influence of size, anisotropy and shape on the formation of magnetic domains and domain walls within one sample has been analyzed by magnetic force microscopy (MFM) to detect the domain wall charge distribution, by x-ray magnetic circular dichroism photoemission electron microscopy (XMCD-PEEM) to get detailed information about the magnetization orientation within the domains, and domain walls and by Kerrmicroscopy to study the remagnetization behavior in different regions of the domains with spatial resolution.